Nitridation of InP(1 0 0) surface studied by synchrotron radiation

dc.creatorPetit, Matthieu
dc.creatorBaca, David
dc.creatorArabasz, S.
dc.creatorBideux, Luc
dc.creatorTsud, Natalia
dc.creatorFabik, S.
dc.creatorGruzza, Bernard
dc.creatorChab, Vladimir
dc.creatorMatolin, Vladimir
dc.creatorPrince, K. C.
dc.date2009-01-30
dc.date.accessioned2026-07-07T12:36:31Z
dc.date.available2026-07-07T12:36:31Z
dc.descriptionThe nitridation of InP(1 0 0) surfaces has been studied using synchrotron radiation photoemission. The samples were chemically cleaned and then ion bombarded, which cleaned the surface and also induced the formation of metallic indium droplets. The nitridation with a Glow Discharge Cell (GDS) produced indium nitride by reaction with these indium clusters. We used the In 4d and P 2p core levels to monitor the chemical state of the surface and the coverage of the species present. We observed the creation of In-N and P-N bonds while the In-In metallic bonds decrease which confirm the reaction between indium clusters and nitrogen species. A theoretical model based on stacked layers allows us to assert that almost two monolayers of indium nitride are produced. The effect of annealing on the nitridated layers at 450 $^\circ$C has also been analysed. It appears that this system is stable up to this temperature, well above the congruent evaporation temperature (370 $^\circ$C) of clean InP(1 0 0): no increase of metallic indium bonds due to decomposition of the substrate is detected as shown in previous works [L. Bideux, Y. Ould-Metidji, B. Gruzza, V. Matolin, Surf. Interface Anal. 34 (2002) 712] studying the InP(1 0 0) surfaces.
dc.identifierhttps://arxiv.org/abs/0901.4906
dc.identifierhttp://arxiv.org/abs/0901.4906
dc.identifierSurface Science 583, 2-3 (2005) 205-212
dc.identifierdoi:10.1016/j.susc.2005.03.040
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/218122
dc.subjectMaterials Science
dc.titleNitridation of InP(1 0 0) surface studied by synchrotron radiation
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