High Reverse Breakdown A-C:H/Si Diodes Manufactured by rf-Pecvd
| dc.creator | Shashi, Paul | |
| dc.creator | Clough, F. J. | |
| dc.date | 2000-07-31 | |
| dc.date.accessioned | 2026-07-07T02:38:21Z | |
| dc.date.available | 2026-07-07T02:38:21Z | |
| dc.description | Thin films of hydrogenated amorphous carbon (a-C:H) deposited by radio frequency plasma-enhanced chemical vapour deposition (rf-PECVD) have been studied for various applications. An interesting property of these films is their high breakdown strength (107 Vcm-1). This property of a-C:H can be exploited in high breakdown heterostructure diodes or as passivation layers and insulator layers in MIS devices. Reports on the applications of a-C:H/Si diodes exist in the literature. Diodes in which the a-C:H films have been deposited by rf-PECVD, have been reported only once. In this article the diodes produced reportedly failed to exhibit reproducible I-V characteristics under high voltage stress. We have investigated the process dependence of structural and electrical properties of rf-PECVD a-C:H films deposited at room temperature from a CH4/Ar gas mixture (at a pressure of 100 mTorr) using a capacitively coupled rf-PECVD. We observe a clear correlation between the dc-self bias and the rectification ratio of a-C:H/Si heterojunction diodes. Optimised diodes show rectification ratios upto 104 and a stable reverse breakdown voltage, typically around 850 V. I-V and C-V measurements show no evidence of hystersis. Scanning Electron Microscopy was carried out to determine the quality of the films deposited. Micro-Raman analysis was used to estimate the ID/IG ratio in the films deposited under different dc-self bias. | |
| dc.description | 6 pages, 4 figures | |
| dc.identifier | https://arxiv.org/abs/cond-mat/0007513 | |
| dc.identifier | http://arxiv.org/abs/cond-mat/0007513 | |
| dc.identifier | MRS FALL MEETING -1999. Published in MRS Proceeding Vol. 593, pp. 427-432 | |
| dc.identifier.uri | http://salesiana.dossiersoluciones.com/handle/123456789/16639 | |
| dc.subject | Materials Science | |
| dc.title | High Reverse Breakdown A-C:H/Si Diodes Manufactured by rf-Pecvd | |
| dc.type | text |