Cell Architecture for Nanoelectronic Design

dc.creatorMartorell, F.
dc.creatorRubio, A.
dc.date2007-08-10
dc.date.accessioned2026-07-07T08:23:08Z
dc.date.available2026-07-07T08:23:08Z
dc.descriptionSeveral nanoelectronic devices have been already proved. However, no architecture which makes use of them provides a feasible opportunity to build medium/large systems. Nanoarchitecture proposals only solve a small part of the problems needed to achieve a real design. In this paper, we propose and analyze a cell architecture that overcomes most of those at the gate level. Using the cell structure we build 2 and 3-input NAND gates showing their error probabilities. Finally, we outline a method to further improve the structure's tolerance by taking advantage of interferences among nanodevices. Using this improvement we show that it is possible to reduce the output standard deviation by a factor larger than $\sqrt{2}$ and restitute the signal levels using nanodevices.
dc.descriptionSubmitted on behalf of TIMA Editions (http://irevues.inist.fr/tima-editions)
dc.identifierhttps://arxiv.org/abs/0708.1454
dc.identifierhttp://arxiv.org/abs/0708.1454
dc.identifierDans European Nano Systems Worshop - ENS 2006, Paris : France (2006)
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/135885
dc.subjectMaterials Science
dc.titleCell Architecture for Nanoelectronic Design
dc.typetext

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