Fluctuations and scaling in models for particle aggregation

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dc.creatorVilone, Daniele
dc.creatorCastellano, Claudio
dc.creatorPoliti, Paolo
dc.date2005-11-15
dc.date2006-04-21
dc.date.accessioned2026-07-07T06:46:08Z
dc.date.available2026-07-07T06:46:08Z
dc.descriptionWe consider two sequential models of deposition and aggregation for particles. The first model (No Diffusion) simulates surface diffusion through a deterministic capture area, while the second (Sequential Diffusion) allows the atoms to diffuse up to \ell steps. Therefore the second model incorporates more fluctuations than the first, but still less than usual (Full Diffusion) models of deposition and diffusion on a crystal surface. We study the time dependence of the average densities of atoms and islands and the island size distribution. The Sequential Diffusion model displays a nontrivial steady-state regime where the island density increases and the island size distribution obeys scaling, much in the same way as the standard Full Diffusion model for epitaxial growth. Our results also allow to gain insight into the role of different types of fluctuations.
dc.description25 pages. Minor changes in the main text and in some figures. Accepted for publication in Surface Science
dc.identifierhttps://arxiv.org/abs/cond-mat/0511380
dc.identifierhttp://arxiv.org/abs/cond-mat/0511380
dc.identifierSurf. Sci. 600, 2392-2401 (2006)
dc.identifierdoi:10.1016/j.susc.2006.04.003
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/103243
dc.subjectMaterials Science
dc.titleFluctuations and scaling in models for particle aggregation
dc.typetext

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