Asymmetric intermixing in Pt/Ti

dc.creatorSüle, P.
dc.creatorMenyhárd, M.
dc.creatorKótis, L.
dc.creatorLábár, J.
dc.creatorEgelhoff Jr, W. F.
dc.date2006-10-09
dc.date.accessioned2026-07-07T07:27:25Z
dc.date.available2026-07-07T07:27:25Z
dc.descriptionThe ion-sputtering induced intermixing is studied by Monte-Carlo TRIM, molecular dynamics (MD) simulations, and Auger electron spectroscopy depth profiling (AES-DP) analysis in Pt/Ti/Si substrate (Pt/Ti) and Ta/Ti/Pt/Si substrate (Ti/Pt) multilayers. Experimental evidence is found for the asymmetry of intermixing in Pt/Ti, and in Ti/Pt. In Ti/Pt we get a much weaker interdiffusion than in Pt/Ti. The unexpected enhancement of the interdiffusion of the Pt atoms into the Ti substrate has also been demonstrated by simulations. We are able to capture the essential features of intermixing using TRIM and MD simulations for ion-beam sputtering and get reasonable values for interface broadening which can be compared with the experimental measurements. However, the origin of the asymmetry remains poorly understood yet.
dc.description7 pages, 3 figures, 1 table, submitted to JAP, fig1a,1b are excluded do to size limit problem (can be seen at http://www.mfa.kfki.hu/~sule/animations/ptti.htm)
dc.identifierhttps://arxiv.org/abs/cond-mat/0610227
dc.identifierhttp://arxiv.org/abs/cond-mat/0610227
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/117368
dc.subjectMaterials Science
dc.titleAsymmetric intermixing in Pt/Ti
dc.typetext

Files

Collections