Two-dimensional Nanolithography Using Atom Interferometry

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dc.creatorGangat, A.
dc.creatorPradhan, P.
dc.creatorPati, G.
dc.creatorShahriar, M. S.
dc.date2004-04-28
dc.date.accessioned2026-07-07T06:09:37Z
dc.date.available2026-07-07T06:09:37Z
dc.descriptionWe propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional 87Rb wavepackets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.
dc.description36 pages, 4 figures
dc.identifierhttps://arxiv.org/abs/quant-ph/0404158
dc.identifierhttp://arxiv.org/abs/quant-ph/0404158
dc.identifierPhys. Rev. A 71, 043606 (2005)
dc.identifierdoi:10.1103/PhysRevA.71.043606
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/92023
dc.subjectQuantum Physics
dc.titleTwo-dimensional Nanolithography Using Atom Interferometry
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