Conformational rearrangements in thin films of polydimethylsiloxane melt

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dc.creatorEvmenenko, Guennadi
dc.creatorMo, Haiding
dc.creatorKewalramani, Sumit
dc.creatorDutta, Pulak
dc.date2005-10-26
dc.date.accessioned2026-07-07T06:45:33Z
dc.date.available2026-07-07T06:45:33Z
dc.descriptionSynchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60A) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 hours for higher molecular weights (close to and above their entanglement value).
dc.description19 pages 3 figures
dc.identifierhttps://arxiv.org/abs/cond-mat/0510713
dc.identifierhttp://arxiv.org/abs/cond-mat/0510713
dc.identifierPolymer 47, 878 (2006)
dc.identifierdoi:10.1016/j.polymer.2005.12.010
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/103074
dc.subjectSoft Condensed Matter
dc.titleConformational rearrangements in thin films of polydimethylsiloxane melt
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