Rietveld refinement and electron density distribution in CuxV2O5

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dc.creatorNithya, R.
dc.creatorChandra, Sharat
dc.creatorReddy, G. L. N.
dc.creatorSahu, H. K.
dc.creatorSastry, V. Sankara
dc.date2004-08-04
dc.date.accessioned2026-07-07T02:59:35Z
dc.date.available2026-07-07T02:59:35Z
dc.descriptionRoom temperature powder x-ray diffraction measurements have been carried out on polycrystalline samples of CuxV2O5 with x = 0.33, 0.40, 0.50, 0.55 and 0.60, prepared by solid state reaction in evacuated quartz tubes. All the samples were found to be in single-phase monoclinic structure. Rietveld full profile refinement of the x-ray diffraction data yielded the lattice parameters and fractional atom coordinates. Maximum entropy inversion of the diffraction data was done in order to obtain the variation in the spatial electron density distribution as a function of copper composition. These density maps show progressive positional and charge disorders in the V-O network induced by addition of copper. It is shown that the electrons donated by copper atoms are transferred to the specific vanadium atom sites.
dc.description9 pages, 6 figures and 2 tables. Discusses changes in electron density distribution in copper vanadates upon increasing copper intercalation
dc.identifierhttps://arxiv.org/abs/cond-mat/0408084
dc.identifierhttp://arxiv.org/abs/cond-mat/0408084
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/24565
dc.subjectMaterials Science
dc.titleRietveld refinement and electron density distribution in CuxV2O5
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