Mobility of dislocations in semiconductors

dc.creatorStokbro, K.
dc.creatorHansen, L. B.
dc.creatorLundqvist, B. I.
dc.date1996-11-25
dc.date.accessioned2026-07-07T09:11:19Z
dc.date.available2026-07-07T09:11:19Z
dc.descriptionAtomic-scale calculations for the dynamics of the 90$^0$ partial glide dislocation in silicon are made using the effective-medium tight-binding theory. Kink formation and migration energies for the reconstructed partial dislocation are compared with experimental results for the mobility of this dislocation. The results confirm the theory that the partial moves in the dissociated state via the formation of stable kinks. The correlation between glide activation energy and band gap in semiconducting systems is discussed.
dc.description4 pages, 2 figures, LaTeX, with sprocl.sty macro package. To appear in the Proceedings of ICPS Berlin July 1996
dc.identifierhttps://arxiv.org/abs/cond-mat/9611191
dc.identifierhttp://arxiv.org/abs/cond-mat/9611191
dc.identifierProceedings of the 23rd International
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/151636
dc.subjectMaterials Science
dc.titleMobility of dislocations in semiconductors
dc.typetext

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