Effect of annealing on electron dephasing in three-dimensional polycrystalline metals

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dc.creatorLin, J. J.
dc.creatorZhong, Y. L.
dc.creatorLi, T. J.
dc.date2001-12-21
dc.date.accessioned2026-07-07T13:11:32Z
dc.date.available2026-07-07T13:11:32Z
dc.descriptionWe have studied the effect of thermal annealing on electron dephasing times $τ_ϕ$ in three-dimensional polycrystalline metals. Measurements are performed on as-sputtered and annealed AuPd and Sb thick films, using weak-localization method. In all samples, we find that $τ_ϕ$ possesses an extremely weak temperature dependence as $T \to 0$. Our results show that the effect of annealing is non-universal, and it depends strongly on the amount of disorder quenched in the microstructures during deposition. The observed "saturation" behavior of $τ_ϕ$ cannot be easily explained by magnetic scattering. We suggest that the issue of saturation can be better addressed in three-dimensional, rather than lower-dimensional, structures.
dc.identifierhttps://arxiv.org/abs/cond-mat/0112421
dc.identifierhttp://arxiv.org/abs/cond-mat/0112421
dc.identifierEurophys. Lett. 57, 872 (2002)
dc.identifierdoi:10.1209/epl/i2002-00591-8
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/229314
dc.subjectMesoscale and Nanoscale Physics
dc.titleEffect of annealing on electron dephasing in three-dimensional polycrystalline metals
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