Kinetics of electric field induced oxygen ion migration in epitaxial metallic oxide films

dc.creatorGhosh, Arindam
dc.creatorRaychaudhuri, A. K.
dc.creatorSreekala, R.
dc.creatorRajeswari, M.
dc.creatorVenkatesan, T.
dc.date1998-11-26
dc.date.accessioned2026-07-07T03:12:12Z
dc.date.available2026-07-07T03:12:12Z
dc.descriptionIn this paper we report the observation of curent induced change of resistance of thin metallic oxide films. The resistance changes at a very low current (current density $J \geq 10^{3}$ A/cm$^{2}$). We find that the time dependence associated with the processes (increase of resistance) show a streched exponential type dependence at lower temperature, which crosses over to a creep type behavior at $T \geq$ 350 K. The time scale associated shows a drastic drop in the magnitude at $T \approx$ 350 K, where a long range diffusion sets in increasing the conductivity noise. The phenomena is like a "glass-transition" in the random lattice of oxygen ions.
dc.description8 pages, 3 figures
dc.identifierhttps://arxiv.org/abs/cond-mat/9811377
dc.identifierhttp://arxiv.org/abs/cond-mat/9811377
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/28819
dc.subjectDisordered Systems and Neural Networks
dc.subjectMaterials Science
dc.titleKinetics of electric field induced oxygen ion migration in epitaxial metallic oxide films
dc.typetext

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