Determination of localized conduction band-tail states distribution in single phase undoped microcrystalline silicon

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dc.creatorRam, Sanjay K.
dc.creatorKumar, Satyendra
dc.creatorCabarrocas, P. Roca i
dc.date2007-08-08
dc.date.accessioned2026-07-07T08:22:46Z
dc.date.available2026-07-07T08:22:46Z
dc.descriptionWe report on the phototransport properties of microstructurally well characterized plasma deposited highly crystallized microcrystalline silicon films. The steady state photoconductivity was measured on a wide microstructural variety of single-phase undoped microcrystalline silicon films as a function of temperature and light intensity. The band-tail parameter (kTc) was calculated from the photoconductivity light intensity exponent values at different temperatures for a range of quasi-Fermi energies. The localized tail states distribution in the vicinity of conduction band edge of microcrystalline silicon was estimated using the values of kTc. Our study shows that microcrystalline silicon films possessing dissimilar microstructural attributes exhibit different phototransport behaviors, which are linked to different features of the density of states maps of the material.
dc.description5 pages, 4 figures
dc.identifierhttps://arxiv.org/abs/0708.1101
dc.identifierhttp://arxiv.org/abs/0708.1101
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/135764
dc.subjectMaterials Science
dc.titleDetermination of localized conduction band-tail states distribution in single phase undoped microcrystalline silicon
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