Interaction of UV photons with solid and nanocrystalline silicon

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dc.creatorPatrone, Lionel
dc.creatorOzerov, Igor
dc.creatorSentis, Marc
dc.creatorMarine, Wladimir
dc.date2003-11-14
dc.date.accessioned2026-07-07T02:54:46Z
dc.date.available2026-07-07T02:54:46Z
dc.descriptionThe studies of interaction of the UV photons with bulk and nanocristalline silicon by time-of-flight (TOF) mass-spectrometry allowed to reveal two populations of Si ion monomers. The first rapid population ejected even at low laser fluences is attributed to Colombian repulsion between the surface charges which are induced by emission of the photoelectrons. When the laser fluence increases, the second slow ion population appears. This population originates from the thermal processes in the irradiated material. The original result of this work is the observation of the non-thermal ion population which represents a considerable part of the laser-induced plume.
dc.descriptionIn French
dc.identifierhttps://arxiv.org/abs/cond-mat/0311336
dc.identifierhttp://arxiv.org/abs/cond-mat/0311336
dc.identifierJ. Phys. IV 11 (2001) 121
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/22691
dc.subjectMaterials Science
dc.titleInteraction of UV photons with solid and nanocrystalline silicon
dc.typetext

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