Atomically precise Si(331)-(12x1) surfaces

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dc.creatorBattaglia, Corsin
dc.creatorMonney, Claude
dc.creatorDidiot, Clement
dc.creatorSchwier, Eike Fabian
dc.creatorMariotti, Nicolas
dc.creatorGarnier, Michael Gunnar
dc.creatorAebi, Philipp
dc.date2008-09-29
dc.date.accessioned2026-07-07T10:06:11Z
dc.date.available2026-07-07T10:06:11Z
dc.descriptionSi(331)-(12x1) is the only confirmed planar silicon surface with a stable reconstruction located between (111) and (110). We have optimized the annealing sequence and are able to obtain almost defect free, atomically precise surface areas approaching micrometer dimensions. The unprecedented perfection of the surface combined with its pronounced structural anisotropy makes it a promising candidate to serve as template for the growth of self-assembled one-dimensional nanostructure arrays.
dc.identifierhttps://arxiv.org/abs/0809.4967
dc.identifierhttp://arxiv.org/abs/0809.4967
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/170236
dc.subjectOther Condensed Matter
dc.titleAtomically precise Si(331)-(12x1) surfaces
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