Nanostructuring lithium niobate substrates by focused ion beam milling

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dc.creatorLacour, F.
dc.creatorCourjal, N.
dc.creatorBernal, M. P.
dc.creatorSabac, A.
dc.creatorBainier, C.
dc.creatorSpajer, M.
dc.date2008-01-28
dc.date.accessioned2026-07-07T08:56:47Z
dc.date.available2026-07-07T08:56:47Z
dc.descriptionWe report on two novel ways for patterning Lithium Niobate (LN) at submicronic scale by means of focused ion beam (FIB) bombardment. The first method consists of direct FIB milling on LiNbO3 and the second one is a combination of FIB milling on a deposited metallic layer and subsequent RIE (Reactive Ion Etching) etching. FIB images show in both cases homogeneous structures with well reproduced periodicity. These methods open the way to the fabrication of photonic crystals on LiNbO3 substrates.
dc.identifierhttps://arxiv.org/abs/0801.4201
dc.identifierhttp://arxiv.org/abs/0801.4201
dc.identifierOptical Materials 27 (2005) 1421-1425
dc.identifierdoi:10.1016/j.optmat.2004.07.016
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/146735
dc.subjectOptics
dc.titleNanostructuring lithium niobate substrates by focused ion beam milling
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