Electromagnetic Field Simulations of Isolated and Periodic 3D Photomask Patterns

Simple item page
dc.creatorBurger, S.
dc.creatorZschiedrich, L.
dc.creatorSchmidt, F.
dc.creatorKöhle, R.
dc.creatorKüchler, B.
dc.creatorNölscher, C.
dc.date2007-09-25
dc.date.accessioned2026-07-07T13:18:20Z
dc.date.available2026-07-07T13:18:20Z
dc.descriptionWe present rigorous 3D EMF simulations of isolated features on photomasks using a newly developed finite-element method. We report on the current status of the finite-element solver JCMsuite, incorporating higher-order edge elements, adaptive refinement methods, and fast solution algorithms. We demonstrate that rigorous and accurate results on light scattering off isolated features can be achived at relatively low computational cost, compared to the standard approach of simulations on large-pitch, periodic computational domains.
dc.description12 pages, 13 figures, SPIE / BACUS conference Photomask Technology (2007)
dc.identifierhttps://arxiv.org/abs/0709.3934
dc.identifierhttp://arxiv.org/abs/0709.3934
dc.identifierProc. SPIE 6730 (2007) 67301W (Photomask Technology 2007, R. J. Naber; H. Kawahira, Eds.)
dc.identifierdoi:10.1117/12.746392
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/231400
dc.subjectOptics
dc.subjectComputational Physics
dc.titleElectromagnetic Field Simulations of Isolated and Periodic 3D Photomask Patterns
dc.typetext

Files

Collections

arXiv