RF Sputter Deposition of Epitaxial Nanocrystalline Nd1-xSrxCoO3 Thin Films

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dc.creatorMalavasi, Lorenzo
dc.creatorQuartarone, Eliana
dc.creatorSanna, Carla
dc.creatorLampis, Nathascia
dc.creatorLehmann, Alessandra Geddo
dc.creatorTealdi, Cristina
dc.creatorMozzati, Maria Cristina
dc.creatorFlor, Giorgio
dc.date2006-07-23
dc.date.accessioned2026-07-07T07:16:07Z
dc.date.available2026-07-07T07:16:07Z
dc.descriptionIn this paper we report the deposition of epitaxial thin films of Nd1-xSrxCoO3 with x=0, 0.2 and 0.5 on single crystalline substrates (SrTiO3 and LaAlO3) carried out by means of rf-magnetron sputtering. The deposited films are all completely oriented and epitaxial and characterized by a nanocrystalline morphology. As-deposited films have an average roughness around 1 nm while after the thermal treatment this increases up to 20 nm while preserving the nanocrystalline morphology. All the films deposited on SrTiO3 have shown to be under a certain degree of tensile strain while those on the LaAlO3 experience a compressive strain thus suggesting that at about 50 nm the films are not fully relaxed, even after the thermal treatment. For the x=0.2 composition three different thickness have been investigated revealing an increased strain for the thinner films.
dc.description32 pages, 11 figures
dc.identifierhttps://arxiv.org/abs/cond-mat/0607584
dc.identifierhttp://arxiv.org/abs/cond-mat/0607584
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/113472
dc.subjectMaterials Science
dc.titleRF Sputter Deposition of Epitaxial Nanocrystalline Nd1-xSrxCoO3 Thin Films
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