Structure and growth of titanium buffer layers on Al2O3(0001)
| dc.creator | Sondergard, E. | |
| dc.creator | Kerjan, O. | |
| dc.creator | Barreteau, C. | |
| dc.creator | Jupille, J. | |
| dc.date | 2004-06-16 | |
| dc.date.accessioned | 2026-07-07T02:58:39Z | |
| dc.date.available | 2026-07-07T02:58:39Z | |
| dc.description | The structure of titanium films on α- Al2O3(0001) surfaces at room temperature was investigated through in situ reflection high energy electron diffraction (RHEED). The α-phase of titanium was observed to grow with the Ti(0001) || Al2O3(0001), Ti[1100] || Al2O3[2110] and Ti[1010] || Al2O3[1100] epitaxy. For up to 6 nm thick films, an other structure was found to coexist with α-Ti. Its presence has dramatic consequences for the wetting of silver, which partly explains the nontrivial buffer effect of titanium at the silver/alumina interface. From the RHEED data, the extra structure is assigned to the high-pressure hexagonal ω-Ti phase. This is supported by tight-binding total energy calculations that demonstrate that the ωphase could actually be stabilized by the α- Al2O3(0001) substrate. | |
| dc.identifier | https://arxiv.org/abs/cond-mat/0406376 | |
| dc.identifier | http://arxiv.org/abs/cond-mat/0406376 | |
| dc.identifier | Surface Science 559 (2004) 131-140 | |
| dc.identifier | doi:10.1016/j.susc.2004.03.072 | |
| dc.identifier.uri | http://salesiana.dossiersoluciones.com/handle/123456789/24189 | |
| dc.subject | Materials Science | |
| dc.title | Structure and growth of titanium buffer layers on Al2O3(0001) | |
| dc.type | text |