Atomic and electronic structure of ultra-thin Al/AlOx/Al interfaces

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dc.creatorDieskova, M.
dc.creatorKonopka, M.
dc.creatorBokes, P.
dc.date2006-08-31
dc.date.accessioned2026-07-07T09:27:11Z
dc.date.available2026-07-07T09:27:11Z
dc.descriptionInterfaces between metals based on AlO$_{x}$ represent the most popular basis for Josephson junctions or, more recently, also for junctions exhibiting substantial tunneling magneto-resistance. We have performed a computational study of possible local geometric structures of such interfaces at the ab-initio DFT/GGA level of approximation to complement recent experimental data on ultra-thin AlO$_{x}$-based interfaces. We present two competing structures that we characterise with their electronic properties: fragmentation and interface energies.
dc.descriptionPresented at the ECOSS24, submitted to the proceeding - special issue of Surf. Science
dc.identifierhttps://arxiv.org/abs/cond-mat/0608718
dc.identifierhttp://arxiv.org/abs/cond-mat/0608718
dc.identifierSurf. Science 601, 4134 (2007)
dc.identifierdoi:10.1016/j.susc.2007.04.056
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/157011
dc.subjectMaterials Science
dc.titleAtomic and electronic structure of ultra-thin Al/AlOx/Al interfaces
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