Magnetoresistance of atomic-scale electromigrated nickel nanocontacts

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dc.creatorKeane, Z. K.
dc.creatorYu, L. H.
dc.creatorNatelson, D.
dc.date2005-10-04
dc.date2006-02-10
dc.date.accessioned2026-07-07T06:44:08Z
dc.date.available2026-07-07T06:44:08Z
dc.descriptionWe report measurements of the electron transport through atomic-scale constrictions and tunnel junctions between ferromagnetic electrodes. Structures are fabricated using a combination of e-beam lithography and controlled electromigration. Sample geometries are chosen to allow independent control of electrode bulk magnetizations. As junction size is decreased to the single channel limit, conventional anisotropic magnetoresistance (AMR) increases in magnitude, approaching the size expected for tunneling magnetoresistance (TMR) upon tunnel junction formation. Significant mesoscopic variations are seen in the magnitude and sign of the magnetoresistance, and no evidence is found of large ballistic magnetoresistance effects.
dc.description3 pages, 3 figures
dc.identifierhttps://arxiv.org/abs/cond-mat/0510094
dc.identifierhttp://arxiv.org/abs/cond-mat/0510094
dc.identifierAppl. Phys. Lett. 88, 062514 (2006)
dc.identifierdoi:10.1063/1.2172232
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/102677
dc.subjectMesoscale and Nanoscale Physics
dc.titleMagnetoresistance of atomic-scale electromigrated nickel nanocontacts
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