Nanomachining of multilayer graphene using an atomic force microscope

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dc.creatorBarthold, P.
dc.creatorLuedtke, T.
dc.creatorHaug, R. J.
dc.date2008-07-25
dc.date.accessioned2026-07-07T09:52:52Z
dc.date.available2026-07-07T09:52:52Z
dc.descriptionAn atomic force microscope is used to structure a film of multilayer graphene. The resistance of the sample was measured in-situ during nanomachining a narrow trench. We found a reversible behavior in the electrical resistance which we attribute to the movement of dislocations. After several attempts also permanent changes are observed. Two theoretical approaches are presented to approximate the measured resistance.
dc.description5 pages, 4 figures
dc.identifierhttps://arxiv.org/abs/0807.4033
dc.identifierhttp://arxiv.org/abs/0807.4033
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/165752
dc.subjectMesoscale and Nanoscale Physics
dc.titleNanomachining of multilayer graphene using an atomic force microscope
dc.typetext

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