Random Deposition Model with a Constant Capture Length

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dc.creatorPoliti, Paolo
dc.creatorSaito, Yukio
dc.date2004-09-02
dc.date2004-12-16
dc.date.accessioned2026-07-07T06:24:00Z
dc.date.available2026-07-07T06:24:00Z
dc.descriptionWe introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance \ell, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.
dc.description14 pages, minor corrections. Accepted for publication in Progress of Theoretical Physics
dc.identifierhttps://arxiv.org/abs/cond-mat/0409048
dc.identifierhttp://arxiv.org/abs/cond-mat/0409048
dc.identifierProg. Theor. Phys. 113, 15-28 (2005)
dc.identifierdoi:10.1143/PTP.113.15
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/96401
dc.subjectStatistical Mechanics
dc.subjectMaterials Science
dc.titleRandom Deposition Model with a Constant Capture Length
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