Surface melting of nanoscopic epitaxial films

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dc.creatorMuller, P.
dc.creatorKern, R.
dc.date2007-06-20
dc.date.accessioned2026-07-07T08:11:19Z
dc.date.available2026-07-07T08:11:19Z
dc.descriptionBy introducing finite size surface and interfacial excess quantities, interactions between interfaces are shown to modify the usual surface premelting phenomenon. It is the case of surface melting of a thin solid film s deposited on a planar solid substrate S. More precisely to the usual wetting condition of the solid s by its own melt l, necessary for premelting (wetting factor F<0), is adjoined a new quantity G describing the interactions of the l/s interface with the s/S interface. When G>0 this interface attraction boosts the premelting so that a two stage boosted surface premelting is foreseen: a continuous premelting, up to roughly half the deposited film, is followed by an abrupt first order premelting. When G<0 these interfaces repell each other so that premelting is refrained and the film remains partly solid above the bulk melting point (overheating) what is called astride melting. Elastic stress modifies both types of melting curves. Bulk and surface stresses have to be distinguished.
dc.description65 pages, 16 figures
dc.identifierhttps://arxiv.org/abs/0706.2966
dc.identifierhttp://arxiv.org/abs/0706.2966
dc.identifierSurface Science 529 (2003) 59
dc.identifierdoi:10.1016/S0039-6028(03)00055-4
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/132086
dc.subjectMaterials Science
dc.titleSurface melting of nanoscopic epitaxial films
dc.typetext

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