Ultraviolet photonic crystal laser

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dc.creatorWu, X.
dc.creatorYamilov, A.
dc.creatorLiu, X.
dc.creatorLi, S.
dc.creatorDravid, V. P.
dc.creatorChang, R. P. H.
dc.creatorCao, H.
dc.date2004-06-01
dc.date.accessioned2026-07-07T05:51:59Z
dc.date.available2026-07-07T05:51:59Z
dc.descriptionWe fabricated two dimensional photonic crystal structures in zinc oxide films with focused ion beam etching. Lasing is realized in the near ultraviolet frequency at room temperature under optical pumping. From the measurement of lasing frequency and spatial profile of the lasing modes, as well as the photonic band structure calculation, we conclude that lasing occurs in the strongly localized defect modes near the edges of photonic band gap. These defect modes originate from the structure disorder unintentionally introduced during the fabrication process.
dc.description4 pages, 4 figures
dc.identifierhttps://arxiv.org/abs/physics/0406005
dc.identifierhttp://arxiv.org/abs/physics/0406005
dc.identifierApplied Physics Letters 85, 3657 (2004)
dc.identifierdoi:10.1063/1.1808888
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/86179
dc.subjectOptics
dc.titleUltraviolet photonic crystal laser
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