Tuneable Capacitor based on dual picks profile of the sacrificial layer

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dc.creatorSoulimane, S.
dc.creatorCasset, F.
dc.creatorChapuis, F.
dc.creatorCharvet, P. -L.
dc.creatoraïd, M.
dc.date2008-02-21
dc.date.accessioned2026-07-07T09:22:25Z
dc.date.available2026-07-07T09:22:25Z
dc.descriptionIn this paper, we present a novel dual gap tuneable capacitor process based on the profile of the sacrificial layer. This profile involves a tri-layer photo-resist process with only one mask level. This realization is based on a special profile of the sacrificial layer designed by two picks. The mechanism of the sacrificial layer realisation is dependent on resist thickness, resist formulation (viscosity, type of polymer and/or solvent, additives...), design of the patterned layer (size or width) and the conditions under which this layer is prepared: thermal treatment, etch back processes... In this communication we demonstrate influence of the later parameters and discuss how a dual pick profile was achieved.
dc.descriptionSubmitted on behalf of EDA Publishing Association (http://irevues.inist.fr/EDA-Publishing)
dc.identifierhttps://arxiv.org/abs/0802.3078
dc.identifierhttp://arxiv.org/abs/0802.3078
dc.identifierDans Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS - DTIP 2007, Stresa, lago Maggiore : Italie (2007)
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/155366
dc.subjectOther Computer Science
dc.titleTuneable Capacitor based on dual picks profile of the sacrificial layer
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