Characterization of Etched Glass Surfaces by Wave Scattering

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dc.creatorJafari, G. R.
dc.creatorMahdavi, S. M.
dc.creatorzad, A. Iraji
dc.creatorKaghazchi, P.
dc.date2005-03-03
dc.date.accessioned2026-07-07T05:54:17Z
dc.date.available2026-07-07T05:54:17Z
dc.descriptionThe roughness of glass surfaces after different stages of etching is investigated by reflection measurements with a spectrophotometer, light scattering, and atomic-force microscopy (in small scale), and Talysurf (in large scale). The results suggest, there are three regimes during etching, according to their optical reflectivity and roughness. The first and second regimes are studied by the Kirchhoff theory and the third one is studied by the geometric theory. Also, we compare the roughness obtained by the optical scattering to the AFM results.
dc.description12 pages, 11 figure
dc.identifierhttps://arxiv.org/abs/physics/0503032
dc.identifierhttp://arxiv.org/abs/physics/0503032
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/86911
dc.subjectOptics
dc.subjectData Analysis, Statistics and Probability
dc.titleCharacterization of Etched Glass Surfaces by Wave Scattering
dc.typetext

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