Biased Structural Fluctuations due to Electron Wind Force

Simple item page
dc.creatorBondarchuk, O.
dc.creatorCullen, W. G.
dc.creatorDegawa, M.
dc.creatorWilliams, Ellen D.
dc.date2007-04-14
dc.date.accessioned2026-07-07T07:56:39Z
dc.date.available2026-07-07T07:56:39Z
dc.descriptionDirect correlation between temporal structural fluctuations and electron wind force is demonstrated, for the first time, by STM imaging and analysis of atomically-resolved motion on a thin film surface under large applied current (10e5 Amp/sqare cm). The magnitude of the momentum transfer between current carriers and atoms in the fluctuating structure is at least five to fifteen times (plus or minus one sigma range) larger than for freely diffusing adatoms. The corresponding changes in surface resistivity will contribute significant fluctuation signature to nanoscale electronic properties.
dc.description15 pages
dc.identifierhttps://arxiv.org/abs/0704.1852
dc.identifierhttp://arxiv.org/abs/0704.1852
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/127387
dc.subjectMaterials Science
dc.subjectStatistical Mechanics
dc.titleBiased Structural Fluctuations due to Electron Wind Force
dc.typetext

Files

Collections

arXiv