Technology for Production of Ultra-Thin Crystal Silicon Membranes

Simple item page
dc.creatorVyssotsky, V. B.
dc.creatorLobko, E. V.
dc.creatorLobko, A. S.
dc.date2005-08-12
dc.date.accessioned2026-07-07T05:55:40Z
dc.date.available2026-07-07T05:55:40Z
dc.descriptionUltra-thin crystal targets in shape of self-supporting membranes were produced for our experiments with parametric x-rays emitted by low-energy electrons. Concise description of the technology developed for production of silicon crystal membranes and the technique for the membrane thickness measurements are considered in the paper. Membrane thickness of ~0.5 micron at 1.0 mm diameter supporting by 2x2 mm silicon substrate of ~200 microns thickness is achieved. Developed technology for thin crystal membrane production can also be applied for manufacturing of various membrane-containing sensors
dc.description3 pages, 2 figures
dc.identifierhttps://arxiv.org/abs/physics/0508079
dc.identifierhttp://arxiv.org/abs/physics/0508079
dc.identifierVyssotsky V.B., Lobko E.V., Lobko A.S. // Proc. 5th Intl. Conf. ''Education, Industry, International Relation'', Minsk-2004, p. 268-271 (in Russian)
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/87321
dc.subjectInstrumentation and Detectors
dc.titleTechnology for Production of Ultra-Thin Crystal Silicon Membranes
dc.typetext

Files

Collections

arXiv