An Aggregation Model for Electrochemical Depostition and its Application to Cop Dendritic Growth

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dc.creatorSanchez, Angel
dc.creatorBernal, Maria J.
dc.creatorRiveiro, Jose M.
dc.date1993-10-21
dc.date.accessioned2026-07-07T09:11:07Z
dc.date.available2026-07-07T09:11:07Z
dc.descriptionWe introduce an aggregation model for general electrochemical deposition experiments. Its most relevant feature is that it includes the overall effect of strong applied electric fields and therefore applies to non-equilibrium situations. We compare our model to experiments on CoP dendritic growth with very good agreement: The model accurately reproduces the dependence on the current of the alloy's composition, morphology, and growth time.
dc.description7 pages. 3 figures available on request from A S (anxo@goshawk.lanl.gov). REVTeX 3.0. LA-UR-93-3946 or MA/UC3M/8/93
dc.identifierhttps://arxiv.org/abs/cond-mat/9310051
dc.identifierhttp://arxiv.org/abs/cond-mat/9310051
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/151566
dc.subjectCondensed Matter
dc.subjectHigh Energy Physics - Lattice
dc.subjectPattern Formation and Solitons
dc.titleAn Aggregation Model for Electrochemical Depostition and its Application to Cop Dendritic Growth
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