Coupled-Resonator Optical Near-Field Lithography

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dc.creatorTsang, Mankei
dc.creatorPsaltis, Demetri
dc.date2008-04-21
dc.date.accessioned2026-07-07T09:33:47Z
dc.date.available2026-07-07T09:33:47Z
dc.descriptionThe problem of pattern formation in resonantly-enhanced near-field lithography by the use of dielectric or plasmonic planar resonators is investigated. Sub-diffraction-limited bright or dark spots can be produced by taking advantage of the rotational invariance of planar resonators. To increase the spatial bandwidth of the resonant enhancement, an array of coupled planar resonators can open up a band of Bloch resonances, analogous to coupled-resonator optical waveguides.
dc.description3 pages, 4 figures
dc.identifierhttps://arxiv.org/abs/0804.3374
dc.identifierhttp://arxiv.org/abs/0804.3374
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/159259
dc.subjectOptics
dc.titleCoupled-Resonator Optical Near-Field Lithography
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