Design and Fabrication of the Suspended High-Q Spiral Inductors with X-Beams

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dc.creatorHsieh, M. C.
dc.creatorJair, D. K.
dc.creatorFang, Y. K.
dc.creatorLin, C. S.
dc.date2008-02-21
dc.date.accessioned2026-07-07T09:22:29Z
dc.date.available2026-07-07T09:22:29Z
dc.descriptionIn this paper, deep sub-micron CMOS process compatible high Q on chip spiral inductors with air gap structure were designed and fabricated. In the design the electromagnetic were used for electrical-characteristics and maximum mechanical strength, respectively. The copper wires were capped with electroless Ni plating to prevent the copper from oxidizing. A Si3N4/ SiO2 X-beam was designed to increase the mechanical strength of the inductor in air gap. The enhancement of maximum mechanical strength of a spiral inductor with X-beams is more than 4500 times. Among these structures, the measured maximum quality factor (Q) of the suspending inductor and frequency at maximum Q are improved from 5.2 and 1.6GHz of conventional spiral inductor to 7.3 and 2.1 GHz, respectively.
dc.descriptionSubmitted on behalf of EDA Publishing Association (http://irevues.inist.fr/EDA-Publishing)
dc.identifierhttps://arxiv.org/abs/0802.3104
dc.identifierhttp://arxiv.org/abs/0802.3104
dc.identifierDans Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS - DTIP 2007, Stresa, lago Maggiore : Italie (2007)
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/155390
dc.subjectOther Computer Science
dc.titleDesign and Fabrication of the Suspended High-Q Spiral Inductors with X-Beams
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