Method to determine defect positions below a metal surface by STM

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dc.creatorAvotina, Ye. S.
dc.creatorKolesnichenko, Yu. A.
dc.creatorOmelyanchouk, A. N.
dc.creatorOtte, A. F.
dc.creatorvan Ruitenbeek, J. M.
dc.date2005-01-31
dc.date.accessioned2026-07-07T06:31:08Z
dc.date.available2026-07-07T06:31:08Z
dc.descriptionThe oscillatory voltage dependence of the conductance of a quantum point contact in the presence of a single point-like defect has been analyzed theoretically. Such signals are detectable and may be exploited to obtain information on defect positions below a metal surface. Both tunnel junctions and ballistic contacts of adiabatic shape have been considered. The effect of quantum interference has been taking into account between the principal wave that is directly transmitted through the contact and the partial wave that is scattered by the contact and the defect. This effect leads to oscillations of the conductance as a function of applied voltage. We obtain the dependence of the period and amplitude of the conductance oscillations on the position of the defect inside the metal.
dc.description16 pages, 7 figures
dc.identifierhttps://arxiv.org/abs/cond-mat/0501751
dc.identifierhttp://arxiv.org/abs/cond-mat/0501751
dc.identifierPhys. Rev. B 71, 115430 (2005)
dc.identifierdoi:10.1103/PhysRevB.71.115430
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/98525
dc.subjectMesoscale and Nanoscale Physics
dc.titleMethod to determine defect positions below a metal surface by STM
dc.typetext

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