ECR Plasma assisted deposition of zinc nanowires

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dc.creatorPurohit, Vishwas S.
dc.creatorShinde, Manish
dc.creatorDey, Shirshendu
dc.creatorPasricha, Renu
dc.creatorDharmadhikari, C. V.
dc.creatorSeth, Tanay
dc.creatorBhoraskar, S. V.
dc.date2006-10-09
dc.date2006-10-10
dc.date.accessioned2026-07-07T07:27:24Z
dc.date.available2026-07-07T07:27:24Z
dc.descriptionDeposits of one-dimensional nanostructures of zinc with diameters of 90-120 nm have been obtained by means of sputtering in an Electron Cyclotron Resonance (ECR) plasma reactor. The sputtering has been made effective by using a negatively biased cylindrical target in a hollow cathode geometry. The nanocrystalline films deposited on the glass substrate were studied with scanning tunneling microscopy/spectroscopy and was found to consist of nanowires having metallic nature. The crystalline nature of these metallic nanowires was studied with x-ray diffraction analysis.
dc.description19 pages 5 figures, full paper sumitted to thin solid films
dc.identifierhttps://arxiv.org/abs/cond-mat/0610216
dc.identifierhttp://arxiv.org/abs/cond-mat/0610216
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/117363
dc.subjectMaterials Science
dc.titleECR Plasma assisted deposition of zinc nanowires
dc.typetext

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