Beating the spatial standard quantum limits via adiabatic soliton expansion

dc.creatorTsang, Mankei
dc.date2006-04-18
dc.date2006-05-09
dc.date.accessioned2026-07-07T07:11:54Z
dc.date.available2026-07-07T07:11:54Z
dc.descriptionSpatial quantum enhancement effects are studied under a unified framework. It is shown that the multiphoton absorption rate of photons with a quantum-enhanced lithographic resolution is reduced, not enhanced, contrary to popular belief. The use of adiabatic soliton expansion is proposed to beat the standard quantum limit on the optical beam displacement accuracy, as well as to engineer an arbitrary multiphoton interference pattern for quantum lithography. The proposed scheme provides a conceptually simple method that works for an arbitrary number of photons.
dc.description4 pages, 1 figure, v2: omitted the requirement of negative refraction
dc.identifierhttps://arxiv.org/abs/quant-ph/0604132
dc.identifierhttp://arxiv.org/abs/quant-ph/0604132
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/111933
dc.subjectQuantum Physics
dc.titleBeating the spatial standard quantum limits via adiabatic soliton expansion
dc.typetext

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