Degradation of Ag/Si multilayers during heat treatments

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dc.creatorKapta, K.
dc.creatorDaroczi, L.
dc.creatorPapp, Z.
dc.creatorBeke, D. L.
dc.creatorLanger, G. A.
dc.creatorCsik, A.
dc.creatorKis-Varga, M.
dc.creatorGreer, A. L.
dc.creatorBarber, Z. H.
dc.date2009-02-12
dc.date.accessioned2026-07-07T12:40:54Z
dc.date.available2026-07-07T12:40:54Z
dc.descriptionMicrostructure changes during annealing of nano-crystalline silver and amorphous silicon multilayers (Ag/a-Si) have been studied by X-ray diffraction and transmission electron microscopy. The dc-magnetron sputtered Ag/a-Si multilayers remained stable even after annealing at 523K for 10h, and microstructural changes occurred only above 600K. The degradation of Ag/a-Si multilayers can be described by the increase of size of Ag grains, formation of grooves and pinholes at Ag grain boundaries and by the diffusion of silicon atoms through the silver grain boundaries and along the Ag/a-Si interfaces. This results in thinning of a-Si layers, and in formation of Ag granulates after longer annealing times.
dc.identifierhttps://arxiv.org/abs/0902.2045
dc.identifierhttp://arxiv.org/abs/0902.2045
dc.identifierVacuum 72 (2004) 85
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/219592
dc.subjectMaterials Science
dc.titleDegradation of Ag/Si multilayers during heat treatments
dc.typetext

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