Applications of the MRI-model in sputter depth profiling

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dc.creatorHofmann, Siegfried
dc.date1998-07-03
dc.date.accessioned2026-07-07T03:10:58Z
dc.date.available2026-07-07T03:10:58Z
dc.descriptionThe physical principles of the MRI model (abbreviation for mixing-roughness- information depth) for the theoretical calculation of measured concentration- depth profiles obtained in sputter depth profiling with AES, XPS, SIMS, etc. are outlined. The main features of the calculation and the respective visual Basic program are explained. Examples demonstrate the usefulness of the current approach for the reconstruction of the original in-depth distribution of composition.
dc.description5 pages postscript
dc.identifierhttps://arxiv.org/abs/cond-mat/9807053
dc.identifierhttp://arxiv.org/abs/cond-mat/9807053
dc.identifierJ.of Surface Analysis 4 (1998) 9-13
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/28408
dc.subjectMaterials Science
dc.titleApplications of the MRI-model in sputter depth profiling
dc.typetext

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