Nano-sculptured thin film thickness variation with incidence angle

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dc.creatorBuzea, Cristina
dc.creatorRobbie, Kevin
dc.date2004-12-09
dc.date.accessioned2026-07-07T03:02:36Z
dc.date.available2026-07-07T03:02:36Z
dc.descriptionIn-situ monitoring and calibration of nano-sculptured thin film thickness is a critical problem due to substrate tilt angle dependent porosity and mass flux. In this letter we present an analytical model for thickness dependence on fabrication parameters for nano-sculptured films. The generality of the model includes universal Gaussian-type flux distribution, non-unity sticking coefficients, variable off-axis sensor location, and substrate tilt. The resulting equation fits well the experimental data. The results can be particularized for films deposited at normal incidence
dc.description5 pages, 4 figures, nanotechnology, nanomaterials
dc.identifierhttps://arxiv.org/abs/cond-mat/0412256
dc.identifierhttp://arxiv.org/abs/cond-mat/0412256
dc.identifierJournal of Optoelectronics and Advanced Materials 6 (2004) 1263-1268
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/25452
dc.subjectMaterials Science
dc.subjectOther Condensed Matter
dc.titleNano-sculptured thin film thickness variation with incidence angle
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