Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene

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dc.creatorWang, Xinran
dc.creatorTabakman, Scott
dc.creatorDai, Hongjie
dc.date2008-05-23
dc.date.accessioned2026-07-07T09:40:47Z
dc.date.available2026-07-07T09:40:47Z
dc.descriptionWe investigate Atomic Layer Deposition (ALD) of metal oxide on pristine and functionalized graphene. On pristine graphene, ALD coating can only actively grow on edges and defect sites, where dangling bonds or surface groups react with ALD precursors. This affords a simple method to decorate and probe single defect sites in graphene planes. We used perylene tetracarboxylic acid (PTCA) to functionalize graphene surface and selectively introduced densely packed surface groups on graphene. Uniform ultrathin ALD coating on PTCA graphene was achieved over large area. The functionalization method could be used to integrate ultrathin high-k dielectrics in future graphene electronics.
dc.description6pages, 3 figures, J. Am. Chem. Soc. in press
dc.identifierhttps://arxiv.org/abs/0805.3712
dc.identifierhttp://arxiv.org/abs/0805.3712
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/161598
dc.subjectMaterials Science
dc.titleAtomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene
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