Microscopic model for spreading of a two-dimensional monolayer

dc.creatorOshanin, G.
dc.creatorDe Coninck, J.
dc.creatorCazabat, A. M.
dc.creatorMoreau, M.
dc.date1998-04-24
dc.date.accessioned2026-07-07T03:10:23Z
dc.date.available2026-07-07T03:10:23Z
dc.descriptionWe study the behavior of a monolayer, which occupies initially a bounded region on an ideal crystalline surface and then evolves in time due to random hopping motion of the monolayer particles. In the case when the initially occupied region is the half-plane $X \leq 0$, we determine explicitly, in terms of an analytically solvable mean-field-type approximation, the mean displacement $X(t)$ of the monolayer edge. We find that $X(t) \approx A \sqrt{D_{0} t}$, in which law $D_{0}$ denotes the bare diffusion coefficient and the prefactor $A$ is a function of the temperature and of the particle-particle interactions parameters. We show that $A$ can be greater, equal or less than zero, and specify the critical parameter which distinguishes between the regimes of spreading ($A > 0)$, partial wetting ($A = 0$) and dewetting ($A < 0$).
dc.description19 pages, 4 figures, to appear in J. of Mol. Liquids
dc.identifierhttps://arxiv.org/abs/cond-mat/9804271
dc.identifierhttp://arxiv.org/abs/cond-mat/9804271
dc.identifierJ. of Mol.Liquids 76, 195 (1998)
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/28224
dc.subjectSoft Condensed Matter
dc.subjectMaterials Science
dc.titleMicroscopic model for spreading of a two-dimensional monolayer
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