Study of Oxygen Diffusion and Clustering in Silicon using an Empirical Interatomic Potential

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dc.creatorJiang, Z.
dc.creatorBrown, R. A.
dc.date1995-04-25
dc.date.accessioned2026-07-07T09:15:51Z
dc.date.available2026-07-07T09:15:51Z
dc.descriptionThe diffusion path and diffusivity of oxygen in crystalline silicon are computed using an empirical interatomic potential which was recently developed for modelling the interactions between oxygen and silicon atoms. The diffusion path is determined by constrained energy minimization, and the diffusivity is computed using jump rate theory. The calculated diffusivity is in excellent agreement with experiemental data. The same interatomic potntial also is used to study the formation of small clusters of oxygen atoms in silicon. The structures of these clusters are found by NPT molecular dynamics simulations, and their free energies are calculated by thermodynamic integration. These free energies are used to predict the temperature dependence of the equilibrium partitioning of oxygen into clusters of different sizes. The calculations show that, for given total oxygen concentration, most oxygen atoms are in clusters at temperature below 1300K, and that the average cluster size increases with decreasing temperature. These results are in qualitative agreement with effects of thermal annealing on oxygen precipitation in silicon crystals.
dc.description6 pages, uuencoded postscript file
dc.identifierhttps://arxiv.org/abs/mtrl-th/9504001
dc.identifierhttp://arxiv.org/abs/mtrl-th/9504001
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/153159
dc.subjectMaterials Science
dc.subjectChemical Physics
dc.titleStudy of Oxygen Diffusion and Clustering in Silicon using an Empirical Interatomic Potential
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