Quantum Lithography in Macroscopic Observations

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dc.creatorCao, De-Zhong
dc.creatorWang, Kaige
dc.date2003-10-07
dc.date.accessioned2026-07-07T06:08:00Z
dc.date.available2026-07-07T06:08:00Z
dc.descriptionWe study the generalized Young's double-slit interference for the beam produced in the spontaneously parametric down-conversion (SPDC). We find that the sub-wavelength lithography can occur macroscopically in both the two-photon intensity measurement and the single-photon spatial intensity correlation measurement. We show the visibility and the strength of the interference fringe related to the SPDC interaction. It may provide a strong quantum lithography with a moderate visibility in practical application.
dc.description6 pages, 5 Postscript figures, uses revtex
dc.identifierhttps://arxiv.org/abs/quant-ph/0310046
dc.identifierhttp://arxiv.org/abs/quant-ph/0310046
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/91491
dc.subjectQuantum Physics
dc.titleQuantum Lithography in Macroscopic Observations
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