Coherent Diffraction Imaging of Single 95nm Nanowires

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dc.creatorFavre-Nicolin, V.
dc.creatorEymery, J.
dc.creatorKoster, R. K.
dc.creatorGentile, P.
dc.date2008-09-12
dc.date2008-12-18
dc.date.accessioned2026-07-07T13:11:40Z
dc.date.available2026-07-07T13:11:40Z
dc.descriptionPhotonic or electronic confinement effects in nanostructures become significant when one of their dimension is in the 5-300 nm range. Improving their development requires the ability to study their structure - shape, strain field, interdiffusion maps - using novel techniques. We have used coherent diffraction imaging to record the 3-dimensionnal scattered intensity of single silicon nanowires with a lateral size smaller than 100 nm. We show that this intensity can be used to recover the hexagonal shape of the nanowire with a 28nm resolution. The article also discusses limits of the method in terms of radiation damage.
dc.description5 pages, 5 figures
dc.identifierhttps://arxiv.org/abs/0809.2222
dc.identifierhttp://arxiv.org/abs/0809.2222
dc.identifierPhys. Rev. B 79 (2009), 195401
dc.identifierdoi:10.1103/PhysRevB.79.195401
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/229357
dc.subjectInstrumentation and Detectors
dc.subjectMaterials Science
dc.titleCoherent Diffraction Imaging of Single 95nm Nanowires
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