Model of crystal growth with simulated self-attraction

dc.creatorTimonin, P. N.
dc.date2008-11-26
dc.date.accessioned2026-07-07T12:04:46Z
dc.date.available2026-07-07T12:04:46Z
dc.descriptionThe (1+1)-dimensional kinetic model of crystal growth with simulated self-attraction and random sequential or parallel dynamics is introduced and studied via Monte-Carlo simulations. To imitate the attraction of absorbing atoms the probability of deposition is chosen to depend on the number of the nearest-neighbor atoms surrounding the deposited atom so it increases with this number. As well the evaporation probabilities are chosed to roughly account for this self-attraction. The model exhibits the interface depinning transition with KPZ-type roughness behavior in the moving phase. The critical indices of the correlation lengths are $ν_\parallel = 0.82 \pm 0.03,{\rm{}}ν_ \bot = 0.55 \pm 0.02$ and the critical index of the growth velocity is $1.08 \pm 0.03$ indicating the new universality class of the depinning transition. The critical properties of the model do not depend on the type of dynamics implemented.
dc.description7 pages, 9 figures
dc.identifierhttps://arxiv.org/abs/0811.4302
dc.identifierhttp://arxiv.org/abs/0811.4302
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/208196
dc.subjectStatistical Mechanics
dc.titleModel of crystal growth with simulated self-attraction
dc.typetext

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