Electronic shot noise in fractal conductors
| dc.creator | Groth, C. W. | |
| dc.creator | Tworzydlo, J. | |
| dc.creator | Beenakker, C. W. J. | |
| dc.date | 2008-03-18 | |
| dc.date.accessioned | 2026-07-07T09:35:58Z | |
| dc.date.available | 2026-07-07T09:35:58Z | |
| dc.description | By solving a master equation in the Sierpinski lattice and in a planar random-resistor network, we determine the scaling with size L of the shot noise power P due to elastic scattering in a fractal conductor. We find a power-law scaling P ~ L^(d_f-2-alpha), with an exponent depending on the fractal dimension d_f and the anomalous diffusion exponent alpha. This is the same scaling as the time-averaged current I, which implies that the Fano factor F=P/2eI is scale independent. We obtain a value F=1/3 for anomalous diffusion that is the same as for normal diffusion, even if there is no smallest length scale below which the normal diffusion equation holds. The fact that F remains fixed at 1/3 as one crosses the percolation threshold in a random-resistor network may explain recent measurements of a doping-independent Fano factor in a graphene flake. | |
| dc.description | 6 pages, 3 figures | |
| dc.identifier | https://arxiv.org/abs/0803.2709 | |
| dc.identifier | http://arxiv.org/abs/0803.2709 | |
| dc.identifier | Phys.Rev.Lett. 100, 176804 (2008) | |
| dc.identifier | doi:10.1103/PhysRevLett.100.176804 | |
| dc.identifier.uri | http://salesiana.dossiersoluciones.com/handle/123456789/160010 | |
| dc.subject | Mesoscale and Nanoscale Physics | |
| dc.title | Electronic shot noise in fractal conductors | |
| dc.type | text |