New cellular automaton designed to simulate epitaxial films growth
| dc.creator | Kosturek, R. | |
| dc.creator | Malarz, K. | |
| dc.date | 2004-06-28 | |
| dc.date.accessioned | 2026-07-07T02:58:53Z | |
| dc.date.available | 2026-07-07T02:58:53Z | |
| dc.description | In this paper a simple (2+1) solid-on-solid model of the epitaxial films growth based on random deposition followed by breaking particle-particle lateral bonds and particles surface diffusion is introduced. The influence of the critical number of the particle-particle lateral bonds $z$ and the deposition rate on the surface roughness dynamics and possible surface morphology anisotropy is presented. The roughness exponent $α$ and the growth exponent $β$ are $(0.863,0.357)$, $(0.215,0.123)$, $(0.101,0.0405)$ and $(0.0718,0.0228)$ for $z=1$, 2, 3 and 4, respectively. Snapshots from simulations of the growth process are included. | |
| dc.description | 10 pages, elsart, 5 figures in 20 files | |
| dc.identifier | https://arxiv.org/abs/cond-mat/0406677 | |
| dc.identifier | http://arxiv.org/abs/cond-mat/0406677 | |
| dc.identifier | Physica A345 (2005) 538 | |
| dc.identifier | doi:10.1016/j.physa.2004.08.013 | |
| dc.identifier.uri | http://salesiana.dossiersoluciones.com/handle/123456789/24289 | |
| dc.subject | Materials Science | |
| dc.subject | Cellular Automata and Lattice Gases | |
| dc.title | New cellular automaton designed to simulate epitaxial films growth | |
| dc.type | text |