Possible persistence of the metal-insulator transition in two-dimensional systems at finite temperatures

dc.creatorMobius, A.
dc.date2002-09-27
dc.date.accessioned2026-07-07T02:47:29Z
dc.date.available2026-07-07T02:47:29Z
dc.descriptionFor the immediate vicinity of the metal-insulator transition (MIT), data on the dependence of the resistivity rho on the charge carrier concentration n from an Si MOSFET experiment by Kravchenko et al. and from an AlAs quantum well study by Papadakis and Shayegan are reanalyzed. In both cases, the rho(T=const.,n) curves for various values of the temperature T seem to exhibit an offset concerning n, where the related resistivity is close to h/e^2. This offset may result from a peculiarity in rho(T=const.,n) indicating the MIT to be present also at finite T. More detailed experiments are imperative.
dc.description3 pages including 3 figures, Revtex; submitted to Phys. Rev. B
dc.identifierhttps://arxiv.org/abs/cond-mat/0209652
dc.identifierhttp://arxiv.org/abs/cond-mat/0209652
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/20028
dc.subjectDisordered Systems and Neural Networks
dc.subjectMesoscale and Nanoscale Physics
dc.titlePossible persistence of the metal-insulator transition in two-dimensional systems at finite temperatures
dc.typetext

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