Formation Energy, Stress, and Relaxations of Low-Index Rhodium Surfaces

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dc.creatorFilippetti, Alessio
dc.creatorFiorentini, Vincenzo
dc.creatorStokbro, Kurt
dc.creatorValente, Riccardo
dc.creatorBaroni, Stefano
dc.date1995-12-12
dc.date.accessioned2026-07-07T09:15:52Z
dc.date.available2026-07-07T09:15:52Z
dc.descriptionAb initio local-density-functional-theory calculations of formation energies, surface stress, and multilayer relaxations are reported for the (111), (100), and (110) surfaces of Rh. The study is performed using ultrasoft pseudopotentials and plane waves in a parallel implementation. Calculated values are in good agreement with previous studies where they exist. In particular, we confirm recent results on surface stress anisotropy of transition metals.
dc.descriptionTwocolumn revtex, 4 pages, no figures
dc.identifierhttps://arxiv.org/abs/mtrl-th/9512001
dc.identifierhttp://arxiv.org/abs/mtrl-th/9512001
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/153169
dc.subjectMaterials Science
dc.titleFormation Energy, Stress, and Relaxations of Low-Index Rhodium Surfaces
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