On the Origin of the Metal-Insulator Transition in 2D

dc.creatorPudalov, V. M.
dc.date1997-07-04
dc.date.accessioned2026-07-07T09:11:54Z
dc.date.available2026-07-07T09:11:54Z
dc.descriptionTwo phenomena have been recently observed in high-mobility Si MOS structures: (1) strong enhancement of the metallic conduction at low temperatures, T < 2K, and (2) the scaling behavior of the temperature and electric field dependences of the resistivity. These results evidence for the true metal-insulator transition in 2d, in apparent disagreement with the one-parameter scaling theory. Here we present a model that explains both effects in the framework of the spin-orbit interaction and provides a quantitative agreement with the experimental data.
dc.description2 pages (postscript) including 1 table and 1 fig
dc.identifierhttps://arxiv.org/abs/cond-mat/9707053
dc.identifierhttp://arxiv.org/abs/cond-mat/9707053
dc.identifierIntern. Conf. on Localization and Quantum Transport in Solids, Jaszowiec, Poland (1996). T.Dietl ed., Inst. of Physics PAN, Warsaw (1996) 34-35
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/151843
dc.subjectStrongly Correlated Electrons
dc.titleOn the Origin of the Metal-Insulator Transition in 2D
dc.typetext

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