Phonon Confinement in Stressed Silicon Nanocluster

dc.creatorSahoo, Satyaprakash
dc.creatorDhara, S.
dc.creatorMahadevan, S.
dc.creatorArora, A. K.
dc.date2008-09-09
dc.date.accessioned2026-07-07T10:01:44Z
dc.date.available2026-07-07T10:01:44Z
dc.descriptionConfined acoustic and optical phonons in Si nanoclusters embedded in sapphire, synthesized using ion-beam implantation are investigated using Raman spectroscopy. The l = 0 and l = 2 confined acoustic phonons, found at low Raman shift, are analyzed using complex frequency model and the size of the nanoparticles are estimated as 4 and 6 nm. For the confined optical phonon, in contrast to expected red shift, the Raman line shape shows a substantial blue shift, which is attributed to size dependent compressive stress in the nanoparticles. The calculated Raman line shape for the stressed nanoparticles fits well to data. The sizes of Si nanoparticles obtained using complex frequency model are consistent with the size estimated from the fitting of confined optical phonon line shapes and those found from X-ray diffraction and TEM.
dc.description15 pages, 4 figures, Conf. edision J. Nanoscience and Nanotechnology (In Press)
dc.identifierhttps://arxiv.org/abs/0809.1543
dc.identifierhttp://arxiv.org/abs/0809.1543
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/168727
dc.subjectMaterials Science
dc.titlePhonon Confinement in Stressed Silicon Nanocluster
dc.typetext

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