Tuning Negative Differential Resistance in a Molecular Film

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dc.creatorGrobis, M.
dc.creatorWachowiak, A.
dc.creatorYamachika, R.
dc.creatorCrommie, M. F.
dc.date2005-03-31
dc.date.accessioned2026-07-07T03:04:23Z
dc.date.available2026-07-07T03:04:23Z
dc.descriptionWe have observed tunable negative differential resistance (NDR) in scanning tunneling spectroscopy measurements of a double layer of C60 molecules on a metallic surface. Using a simple model we show that the observed NDR behavior is explained by voltage-dependent changes in the tunneling barrier height.
dc.identifierhttps://arxiv.org/abs/cond-mat/0503765
dc.identifierhttp://arxiv.org/abs/cond-mat/0503765
dc.identifierAppl. Phys. Lett 86, 204102 (2005)
dc.identifierdoi:10.1063/1.1931822
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/26116
dc.subjectMesoscale and Nanoscale Physics
dc.subjectMaterials Science
dc.titleTuning Negative Differential Resistance in a Molecular Film
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